The Effects of Radiation on High-Technology Polymers

Content: Radiation chemistry of polymers / James H. O'Donnell--
Early events in high-energy irradiation of polymers / David F. Sangster --
Spectroscopic methods in polymer studies / Kenneth P. Ghiggino --
Flash photolysis of aromatic diisocyanate-based polyurethanes / Charles E. Hoyle, Young G. No, and Keziban S. Ezzell --
Photophysics of hydroxyphenylbenzotriazole polymer photostabilizers / Kenneth P. Ghiggino, A.D. Scully, and S.W. Bigger --
Radiolysis of polycarboxylic acids and model compounds / K.T. Campbell, D.J.T. Hill, James H. O'Donnell, P.J. Pomery, and C.L. Winzor --
Photophysical studies of spin-cast polymer films / L.L. Kosbar, S.W.J. Kuan, C.W. Frank, and R.F.W. Pease --
Effects of various additives on accelerated grafting and curing reactions initiated by UV and ionizing radiation / Paul A. Dworjanyn, Barry Fields, and John L. Garnett --
Radiation chemistry of polymers for electronic applications / Elsa Reichmanis --
Imaging processes based on side-chain modification of polymers : synthesis and study of allylic and benzylic ethers derived from poly(vinylphenols) / Jean M.J. Fréchet, Eva Eichler, Sylvie Gauthier, Bogustav Kryczka, and C.G. Willson --
X-ray-sensitive alternating copolymers / S.R. Turner, C.C. Anderson, K.M. Kolterman, and D. Seligson --
Effect of proton beam energy on the sensitivity and contrast of select Si-containing resists / Diana D. Granger, Leroy J. Miller, and Margaret M. Lewis --
Novel principle of image recording : photochemically triggered physical amplification of photoresponsiveness in molecular aggregate systems / Shigeo Tazuke and Tomiki Ikeda --
Radiation durability of polymeric matrix composites / Darrel R. Tenney and Wayne S. Slemp --
Radiation-resistant, amorphous, all-aromatic poly(arylene ether sulfones) : synthesis, physical behavior, and degradation characteristics / D.A. Lewis, James H. O'Donnell, J.L. Hedrick, T.C. Ward, and J.E.E. McGrath.